Flow control in a laser charging chamber Proportionair an electrical proportional valve

This sketch shows a laser charging chamber flow control application that requires 3 gas mixtures that can be dynamically adjusted. Three F Series closed loop flow controllers were used-one for each gas control. The mixture can be changed by adjusting the command signal of the corresponding flow controller. Since this is a closed loop control scheme, the signal from the flow monitor can be used for data acquisition. This signal is available on pin 5 of the FQPV2 main electrical connector.

QB3 is also used in this application to control the vacuum in the charging chamber. The vacuum level is a critical component that requires repeatable control to help maintain the proper level of each gas in the charging chamber.

Electrical, flow, control, gas, signal, application, mixture